Motion Resolution:0.05 μm |
Motion Speed:50 mm/s |
Probe Module Resolution:0.05 μm |
Probe Module Stroke:50 mm |
Repeatability Accuracy:≤1 μm |
Rotation Speed:2°/s |
Rotation Stroke:±4° |
Wafer Size:205 mm (8 inch) |
X Axis Stroke:300 mm |
Y Axis Stroke:700 mm |
Z Axis Stroke:20 mm |
Z-axis Resolution:0.1 μm |
Z-axis Speed:Max 10 mm/s |
Communication Interface:网络 |
Operating Temperature:-5~75℃ |
加载方式:手动加载 |
卡顿率:<1/10,000 |
压力范围:25~200Kpa (绝对压力,取决于压力发生器) |
支持DUT尺寸:2 x 2mm 到 10 x 10mm |
温度均匀性:<0.3℃ |
温度精度:±0.5℃ |
湿度精度:±2%RH |
湿度范围:5%RH~95%RH@25℃~85℃ |
设备尺寸 (长×宽×高):1,000mm x 1,000mm x 1,800mm |
设备重量:350KG/m2 |
软件系统:自动控制+功能测试 |
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